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Process for reducing surface roughness in polycrystalline silicon thin films
Summary
This technology is a rapid processing method for reducing the surface roughness of polycrystalline silicon thin-films.
Technology Benefits
Rapidly reduces surface roughness in polycrystalline silicon thin films Can reduce surface roughness by more than 50%Can be used in reverse to create rough surfaces for other applicationsCompatible with high-throughput film production methods
Technology Application
Production of high-performance thin-film transistors from silicon and other materialsTransistor arrays for LCD and OLED displaysTransistor arrays for sensing devicesTransistor arrays for flexible electronics
Detailed Technology Description
None
Country/Region
USA
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