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Process for reducing surface roughness in polycrystalline silicon thin films
总结
This technology is a rapid processing method for reducing the surface roughness of polycrystalline silicon thin-films.
技术优势
Rapidly reduces surface roughness in polycrystalline silicon thin films Can reduce surface roughness by more than 50%Can be used in reverse to create rough surfaces for other applicationsCompatible with high-throughput film production methods
技术应用
Production of high-performance thin-film transistors from silicon and other materialsTransistor arrays for LCD and OLED displaysTransistor arrays for sensing devicesTransistor arrays for flexible electronics
详细技术说明
None
国家/地区
美国
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