AsiaIPEX is a one-stop-shop for players in the IP industry, facilitating IP trade and connection to the IP world. Whether you are a patent owner interested in selling your IP, or a manufacturer looking to buy technologies to upgrade your operation, you will find the portal a useful resource.

Back to search results

Optimized Device And Analytical Methods For Measuring Properties Of Micro- And Nano- Scale Systems

Technology Benefits

Less expensiveMore accurateFaster assessmentsMinimal chip area

Technology Application

Applications include nanoscale calipers, manipulators and force gauges used for determining physical forces, developing fabrication processes, calibrating simulations of devices, and automatically recalibrating devices to account for environmental changes.

Detailed Technology Description

None

Supplementary Information

Patent Number: US8079246B2
Application Number: US2007737532A
Inventor: Garmire, David | Choo, Hyuck | Muller, Richard S. | Demmel, James | Govindjee, Sanjay
Priority Date: 19 Apr 2006
Priority Number: US8079246B2
Application Date: 19 Apr 2007
Publication Date: 20 Dec 2011
IPC Current: G01P002100 | B81C009900
US Class: 07300179 | 07350414 | 07351432 | 3247503
Assignee Applicant: The Regents of the University of California
Title: Integrated MEMS metrology device using complementary measuring combs
Usefulness: Integrated MEMS metrology device using complementary measuring combs
Summary: For in-situ monitoring of geometric, material, process and dynamic properties of MEMS device such as MEMS accelerometer.
Novelty: Micro-electromechanical system (MEMS) metrology device for in-situ monitoring of MEMS device properties, has complementary measuring combs that measures displacement of shuttle and electric potential applied to each of comb drives

Industry

Electronics

Sub Group

Semiconductor

Application No.

8079246

Others

Tech ID/UC Case

17597/2006-028-0

Related Cases

2006-028-0

Country/Region

USA

For more information, please click Here