Optimized Device And Analytical Methods For Measuring Properties Of Micro- And Nano- Scale Systems
- 技术优势
- Less expensiveMore accurateFaster assessmentsMinimal chip area
- 技术应用
- Applications include nanoscale calipers, manipulators and force gauges used for determining physical forces, developing fabrication processes, calibrating simulations of devices, and automatically recalibrating devices to account for environmental changes.
- 详细技术说明
- None
- *Abstract
-
As micro- and nano-scale electromechanical systems become commercially established, the widespread success of these products will be hindered unless testing methods and standards are developed to measure the properties of these products. Currently, the lack of testing methods and standards makes it difficult for customers to specify their requirements, and manufacturers to specify the properties of their products. Furthermore, testing standards for these micro- and nano- scale products are difficult to develop because they are prone to numerous uncertain properties due to their extreme sensitivity to process variations in how they are both fabricated and tested. While a few testing standards exist, their relatively high costs, long duration and uncertain accuracy make them nonideal for facilitating the growth of these emerging products.
To address these issues, researchers at UC Berkeley have designed an electromechanical device and developed associated analysis techniques that make the measuring of micro- and nano- scale systems commercially viable. This compact device can fit inside a 1 mm by 1 mm square or smaller. It can accurately measure in-plane over- or under- cut, effective Young's Modulus, and the comb-drive force for the material and process in which it was made.
In contrast to other similar techniques, this device and the methods used to measure properties are more accurate and economical.
- *IP Issue Date
- Dec 20, 2011
- *Principal Investigation
-
Name: Hyuck Choo
Department:
Name: James Demmel
Department:
Name: David Garmire
Department:
Name: Sanjay Govindjee
Department:
Name: Richard Muller
Department:
- 附加资料
- Patent Number: US8079246B2
Application Number: US2007737532A
Inventor: Garmire, David | Choo, Hyuck | Muller, Richard S. | Demmel, James | Govindjee, Sanjay
Priority Date: 19 Apr 2006
Priority Number: US8079246B2
Application Date: 19 Apr 2007
Publication Date: 20 Dec 2011
IPC Current: G01P002100 | B81C009900
US Class: 07300179 | 07350414 | 07351432 | 3247503
Assignee Applicant: The Regents of the University of California
Title: Integrated MEMS metrology device using complementary measuring combs
Usefulness: Integrated MEMS metrology device using complementary measuring combs
Summary: For in-situ monitoring of geometric, material, process and dynamic properties of MEMS device such as MEMS accelerometer.
Novelty: Micro-electromechanical system (MEMS) metrology device for in-situ monitoring of MEMS device properties, has complementary measuring combs that measures displacement of shuttle and electric potential applied to each of comb drives
- 主要类别
- 电子
- 细分类别
- 半导体
- 申请号码
- 8079246
- 其他
-
Tech ID/UC Case
17597/2006-028-0
Related Cases
2006-028-0
- 国家/地区
- 美国
