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Generation of crystalline thin films with variable thickness regions using laser irradiation

Summary
James S. Im, Ph.D.
Technology Benefits
Decreases cost and production time of crystalline thin films with region-dependent performance requirements Allows for highly customizable production of crystalline thin filmsCan be used with several irradiation techniques, including sequential laser solidification (SLS), excimer laser annealing (ELA), and uniform grain structure (UGS).Patent information:Patent Issued (US7,691,687)Tech Ventures Reference: IR M03-054
Technology Application
Fabrication of thin film transistors for LCD technologiesFabrication of crystalline thin films for image sensors
Detailed Technology Description
James S. Im, Ph.D.
*Abstract
None
*Inquiry
Jim AloiseColumbia Technology VenturesTel: (212) 854-8444Email: TechTransfer@columbia.edu
*IR
M03-054
*Principal Investigator
*Web Links
Patent number: US20050059223
Country/Region
USA

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