Generation of crystalline thin films with variable thickness regions using laser irradiation
- 总结
- James S. Im, Ph.D.
- 技术优势
- Decreases cost and production time of crystalline thin films with region-dependent performance requirements Allows for highly customizable production of crystalline thin filmsCan be used with several irradiation techniques, including sequential laser solidification (SLS), excimer laser annealing (ELA), and uniform grain structure (UGS).Patent information:Patent Issued (US7,691,687)Tech Ventures Reference: IR M03-054
- 技术应用
- Fabrication of thin film transistors for LCD technologiesFabrication of crystalline thin films for image sensors
- 详细技术说明
- James S. Im, Ph.D.
- *Abstract
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None
- *Inquiry
- Jim AloiseColumbia Technology VenturesTel: (212) 854-8444Email: TechTransfer@columbia.edu
- *IR
- M03-054
- *Principal Investigation
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- *Web Links
- Patent number: US20050059223
- 国家/地区
- 美国
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