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Modification of surfaces with nanoparticles using a photo-chemical approach

Summary
Jeffrey T. Koberstein, Ph.D.
Technology Benefits
Controllable spatial resolution of nanoparticle patterning using lithography and photo-masks.Controllable thickness of grafted surface.Increased durability against scratch, tear, and chemical resistance.Can tailor choice of photo-active linkers and nanoparticles for specific use.Patent information:Patent Pending (US 20110059264)
Technology Application
Electronic applications including high density digital data storage, touch screens, and photovoltaic applications. Biomedical applications including biosensors and drug delivery nanoparticle substrate coatings.
Detailed Technology Description
Jeffrey T. Koberstein, Ph.D.
*Abstract
None
*Inquiry
Beth KaudererColumbia Technology VenturesTel: (212) 854-8444Email: TechTransfer@columbia.edu
*IR
M10-009
*Principal Investigator
*Publications
EJ Park, T Wagenaar, S Zhang, AJ Link, RK Prudhomme, JT Koberstein, NJ Turro. Using Light to Covalently Immobilize and Pattern Nanoparticles onto Surfaces, Langmuir, Vol. 28, Issue 29, July 2012, pp. 10934-10941.EJ Park. Development of Photochemical Surface Modification Technique, Academic Commons Columbia University.Further Information: Columbia | Technology VenturesTeresa Fazio, Ph.D.; Tel: (212) 854-4028Email: TechTransfer@columbia.edu
Country/Region
USA

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