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Modification of surfaces with nanoparticles using a photo-chemical approach

总结

Jeffrey T. Koberstein, Ph.D.

技术优势

Controllable spatial resolution of nanoparticle patterning using lithography and photo-masks.Controllable thickness of grafted surface.Increased durability against scratch, tear, and chemical resistance.Can tailor choice of photo-active linkers and nanoparticles for specific use.Patent information:Patent Pending (US 20110059264)

技术应用

Electronic applications including high density digital data storage, touch screens, and photovoltaic applications. Biomedical applications including biosensors and drug delivery nanoparticle substrate coatings.

详细技术说明

Jeffrey T. Koberstein, Ph.D.

*Abstract

None

*Inquiry

Beth KaudererColumbia Technology VenturesTel: (212) 854-8444Email: TechTransfer@columbia.edu

*IR

M10-009

*Principal Investigation

*Publications

EJ Park, T Wagenaar, S Zhang, AJ Link, RK Prudhomme, JT Koberstein, NJ Turro. Using Light to Covalently Immobilize and Pattern Nanoparticles onto Surfaces, Langmuir, Vol. 28, Issue 29, July 2012, pp. 10934-10941.EJ Park. Development of Photochemical Surface Modification Technique, Academic Commons Columbia University.Further Information: Columbia | Technology VenturesTeresa Fazio, Ph.D.; Tel: (212) 854-4028Email: TechTransfer@columbia.edu

国家/地区

美国