亚洲知识产权资讯网为知识产权业界提供一个一站式网上交易平台,协助业界发掘知识产权贸易商机,并与环球知识产权业界建立联系。无论你是知识产权拥有者正在出售您的知识产权,或是制造商需要购买技术以提高操作效能,又或是知识产权配套服务供应商,你将会从本网站发掘到有用的知识产权贸易资讯。

Modification of surfaces with nanoparticles using a photo-chemical approach

总结
Jeffrey T. Koberstein, Ph.D.
技术优势
Controllable spatial resolution of nanoparticle patterning using lithography and photo-masks.Controllable thickness of grafted surface.Increased durability against scratch, tear, and chemical resistance.Can tailor choice of photo-active linkers and nanoparticles for specific use.Patent information:Patent Pending (US 20110059264)
技术应用
Electronic applications including high density digital data storage, touch screens, and photovoltaic applications. Biomedical applications including biosensors and drug delivery nanoparticle substrate coatings.
详细技术说明
Jeffrey T. Koberstein, Ph.D.
*Abstract
None
*Inquiry
Beth KaudererColumbia Technology VenturesTel: (212) 854-8444Email: TechTransfer@columbia.edu
*IR
M10-009
*Principal Investigation
*Publications
EJ Park, T Wagenaar, S Zhang, AJ Link, RK Prudhomme, JT Koberstein, NJ Turro. Using Light to Covalently Immobilize and Pattern Nanoparticles onto Surfaces, Langmuir, Vol. 28, Issue 29, July 2012, pp. 10934-10941.EJ Park. Development of Photochemical Surface Modification Technique, Academic Commons Columbia University.Further Information: Columbia | Technology VenturesTeresa Fazio, Ph.D.; Tel: (212) 854-4028Email: TechTransfer@columbia.edu
国家/地区
美国

欲了解更多信息,请点击 这里
移动设备