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Uniform Polycrystalline Thin Films for Use in High-Performance Thin-Film Transistors

Summary
James S. Im, Ph.D.
Technology Benefits
Produces more uniform films than conventional annealing methodsReduces the number of processing stepsCan be used on a variety of materials, including siliconCan be used in combination with a variety of film deposition methodsPatent Information:Patent Issued (US8,415,670)Tech Ventures Reference: IR M07-039
Technology Application
High-performance thin film transistorsActive matrix organic light emitting diode (AMOLED) AMOLED DisplaysActive matrix liquid crystal displays (AMLCDs)
Detailed Technology Description
James S. Im, Ph.D.
*Abstract
None
*Inquiry
Jim AloiseColumbia Technology VenturesTel: (212) 854-8444Email: TechTransfer@columbia.edu
*IR
M07-039
*Principal Investigator
*Publications
Im, J S. "A New Excimer-Laser-Annealing Method for Manufacturing Large OLED Displays" MRS Proceedings. 2012 (1426):239-249. .
*Web Links
Patent Issued: 7,160,763
Country/Region
USA

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