Uniform Polycrystalline Thin Films for Use in High-Performance Thin-Film Transistors
- 總結
- James S. Im, Ph.D.
- 技術優勢
- Produces more uniform films than conventional annealing methodsReduces the number of processing stepsCan be used on a variety of materials, including siliconCan be used in combination with a variety of film deposition methodsPatent Information:Patent Issued (US8,415,670)Tech Ventures Reference: IR M07-039
- 技術應用
- High-performance thin film transistorsActive matrix organic light emitting diode (AMOLED) AMOLED DisplaysActive matrix liquid crystal displays (AMLCDs)
- 詳細技術說明
- James S. Im, Ph.D.
- *Abstract
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None
- *Inquiry
- Jim AloiseColumbia Technology VenturesTel: (212) 854-8444Email: TechTransfer@columbia.edu
- *IR
- M07-039
- *Principal Investigation
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- *Publications
- Im, J S. "A New Excimer-Laser-Annealing Method for Manufacturing Large OLED Displays" MRS Proceedings. 2012 (1426):239-249. .
- *Web Links
- Patent Issued: 7,160,763
- 國家/地區
- 美國
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