Tunnel Coupling Layer for Efficient Quantum Dot Lasers
- Detailed Technology Description
- This technology uses thin quantum well coupling layers to enhance transport of electron-hole pairs between quantum dots, making QD lasers more efficient, and avoiding the limitations of existing QD technology.
- Countries
- United States
- Application No.
- 6773949
- *Abstract
-
A major problem with quantum dot (QD) lasers is the stochastic nature of QD structures, the lack of uniformity, the insufficient QD density, and the poor QD-to-QD coupling. This technology uses thin quantum well coupling layers to enhance transport of electron-hole pairs between quantum dots, making QD lasers more efficient, and avoiding the limitations of existing QD technology.
DESCRIPTION/DETAILS
A major problem with QD lasers is the stochastic nature of QD structures, the lack of uniformity, the insufficient QD density, and the poor QD-to-QD coupling. A solution to the problem is to couple, via a thin barrier, the sheet of QDs to a quantum well (QW) layer. Electron-hole transport in the QW layer can rearrange the electron-hole pairs in the plane and provide the dot-to-dot coupling. That is, an electron tunnels from the QD to the QW layer, transports in the plane in the QW layer, and re-tunnels back into another QD.
This technology uses thin quantum well coupling layers to enhance transport of electron-hole pairs between quantum dots, making QD lasers more efficient. A semiconductor device using this technology would be layered as follows:
- 200-nm cladding layer
- 50-nm waveguide layer
- 15 mono-layers of quantum dots
- 1-10-nm coupling barrier layer
- 2-10-nm quantum well layer
- 1-10-nm coupling barrier layer
- 15 mono-layers of quantum dots
- 50-nm waveguide layer
- 200-nm cladding layer
BENEFITS
By creating a uniform, dense layer of quantum dots, this technology enhances transport of electron-hole pairs into and between quantum dots for greater efficiency of edge emitting lasers (EELs), and other semiconductor devices.
- Increased device performance efficiency
- Increased emission brightness
- Increased emission selectivity, which decreases spectral smearing
For more information about this technology, please contact the University of Illinois at Urbana-Champaign Office of Technology Management at otm@illinois.edu.
- *IP Issue Date
- None
- *IP Type
- Utility
- Country/Region
- USA

