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Composition and Method of Forming Functionalized Cyclohexasilanes

Detailed Technology Description: None

Supplementary Information: Patent Number: US8609799B2
Application Number: US2010993239A
Inventor: Schulz, Douglas L. | Dai, Xuliang | Nelson, Kendric J. | Boudjouk, Philip
Priority Date: 29 May 2008
Priority Number: US8609799B2
Application Date: 5 Jan 2011
Publication Date: 17 Dec 2013
IPC Current: C08G007730
US Class: 528023 | 423341 | 423342 | 528010 | 528033 | 528037
Assignee Applicant: NDSU Research Foundation,Fargo
Title: Method of forming functionalized silanes
Usefulness: Method of forming functionalized silanes
Summary: In electronic materials for inorganic semiconductors.
Novelty: New heteroatom doped silane derivatives useful in electronic materials for inorganic semiconductors

Industry: Chemical/Material

Sub Category: Chemical/Material Application

*Abstract: This invention pertains to a composition of matter derived from cyclohexasilane. The compound has unique physical properties and can exist in a liquid state at standard temperature and pressure - a characteristic that renders them appropriate for applications in novel deposition routes including high-speed printing and direct-write. The invention has applications in the manufacture of silicon-bassed solar cell in the photovoltaic industry.

Country/Region: USA

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