Composition and Method of Forming Functionalized Cyclohexasilanes
- 詳細技術說明
- None
- *Abstract
-
This invention pertains to a composition of matter derived from cyclohexasilane. The compound has unique physical properties and can exist in a liquid state at standard temperature and pressure - a characteristic that renders them appropriate for applications in novel deposition routes including high-speed printing and direct-write. The invention has applications in the manufacture of silicon-bassed solar cell in the photovoltaic industry.
- 附加資料
- Patent Number: US8609799B2
Application Number: US2010993239A
Inventor: Schulz, Douglas L. | Dai, Xuliang | Nelson, Kendric J. | Boudjouk, Philip
Priority Date: 29 May 2008
Priority Number: US8609799B2
Application Date: 5 Jan 2011
Publication Date: 17 Dec 2013
IPC Current: C08G007730
US Class: 528023 | 423341 | 423342 | 528010 | 528033 | 528037
Assignee Applicant: NDSU Research Foundation,Fargo
Title: Method of forming functionalized silanes
Usefulness: Method of forming functionalized silanes
Summary: In electronic materials for inorganic semiconductors.
Novelty: New heteroatom doped silane derivatives useful in electronic materials for inorganic semiconductors
- 主要類別
- 化工/材料
- 細分類別
- 化工/材料應用
- 國家/地區
- 美國
欲了解更多信息，請點擊 這裡
