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Real Time-Determination of Interconnnect Metrology Using Binary Computer Generated Programs
Detailed Technology Description
Holographictest structures on a semiconductor wafer are used to provide real-time analysisof upstream fabrication processing parameters. The test structures comprisereflective segments within multiple cells on the test structure. The sizeand placement of the reflective segments within the cells are determined bydiffraction theory in such a way that a desired image is projected from thetest structure. The intensity, sharpness, and shape of the image is used as a directmeasure of the upstream fabrication process parameters.
Countries
United States
Application No.
Patent Granted
Country/Region
USA
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