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Real Time-Determination of Interconnnect Metrology Using Binary Computer Generated Programs

詳細技術說明
Holographictest structures on a semiconductor wafer are used to provide real-time analysisof upstream fabrication processing parameters. The test structures comprisereflective segments within multiple cells on the test structure. The sizeand placement of the reflective segments within the cells are determined bydiffraction theory in such a way that a desired image is projected from thetest structure. The intensity, sharpness, and shape of the image is used as a directmeasure of the upstream fabrication process parameters.
*Abstract
None
*Inquiry
DeniseM. BierleinUniversity of DelawareOffice of Economic Innovation and PartnershipsLicensing AnalystTelephone:  (302) 831-4005Email:  deniseb@udel.edu
*IP Issue Date
None
*IP Type
Utility
國家
United States
申請號碼
Patent Granted
國家/地區
美國

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