AsiaIPEX is a one-stop-shop for players in the IP industry, facilitating IP trade and connection to the IP world. Whether you are a patent owner interested in selling your IP, or a manufacturer looking to buy technologies to upgrade your operation, you will find the portal a useful resource.

Back to search results

A CHEMICAL VAPOUR DEPOSITION SYSTEM AND PROCESS

Summary

The present invention relates to a chemical vapour deposition (CVD) system and process, and in particular to a system and process for depositing semiconductors such as silicon carbide.

Technology Benefits

A novel approach to the deposition of Silicon Carbide on an inexpensive substrate (Silicon).

Technology Application

Semiconductor Manufacturing

Detailed Technology Description

A chemical vapour deposition system, including: a process tube for receiving at least one sample, the process tube being constructed of silicon carbide, impregnated with silicon, and coated with silicon carbide; a pumping system to evacuate the process tube to high vacuum; one or more gas inlets for introducing one or more process gases into the evacuated process tube; and a heater to heat the process tube and thereby heat the one or more process gases and the at least one sample within the process tube to cause a material to be deposited onto the at least one sample within the process tube by chemical vapour deposition.

Type of Cooperation

Licensing

Application Date

12/02/2010 00:00:00

Application No.

AU2010213363
CN201080007530.9
JP2011-549395
KR10-2011-7018726
MYPI2011003565
US13/148942

Country/Region

Australia

For more information, please click Here