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Real Time-Determination of Interconnnect Metrology Using Binary Computer Generated Programs

Detailed Technology Description: Holographictest structures on a semiconductor wafer are used to provide real-time analysisof upstream fabrication processing parameters. The test structures comprisereflective segments within multiple cells on the test structure. The sizeand placement of the reflective segments within the cells are determined bydiffraction theory in such a way that a desired image is projected from thetest structure. The intensity, sharpness, and shape of the image is used as a directmeasure of the upstream fabrication process parameters.

Countries: United States

Application No.: Patent Granted

*Abstract: None

*Inquiry: DeniseM. BierleinUniversity of DelawareOffice of Economic Innovation and PartnershipsLicensing AnalystTelephone: (302) 831-4005Email: deniseb@udel.edu

*IP Issue Date: None

*IP Type: Utility

Country/Region: USA

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