Project ID: D2007-12U.S. Patent #8,211,858; Canada, European patents pendingU.S. Patent #7,592,422; Canada, France, Germany, Netherlands, UK patents pendingNovelty: Modified plasminogen activator inhibitor type I (PAI- 1) with significantly increased in vivo half-life and decreased activity to uroki.....
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A method to address starvation and fairness in wireless network communications.
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Silicon material is a cost efficientapproach to manufacturing optoelectronic sensors.Unique femtosecond laser irradiationmethod does not require expensive and complicated facilities.Amorphous silicon is easier to generateas it is embedded in the nano-crystalline layer.
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This technology is a self-cleaning high throughput organometallic vapor phase epitaxy (OMVPE) apparatus for deposition of material on substrates, and especially for epitaxial deposition of compound semiconductor materials.
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An adaptable modular, high-throughput drug screening technology.
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