Equipment for the preparation of a nanostructured superhydrophobic surface layer with a radially symmetric wettability gradient
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- Detailed Technology Description
- The solution is a device (1) for preparing a nanostructured superhydrophobic surface layer (8) on a support substrate (6) with a radially symmetric wettability gradient comprising at least one deposition chamber (2) for inserting the support substrate (6) and at least one nanoparticle source (3) for generating a beam of nanoparticles (7) into the deposition chamber (2), characterized in that between the nanoparticle source (3) and the deposition chamber (2) at least one ECWR electrode (4) is arranged such that the negative electric field generated by the ECWR electrode (4) ) surrounds the nanoparticle beam (7), and in the deposition chamber (3) there is at least one negatively charged control electrode (5) arranged in the projection of the nanoparticle beam (7) on the surface of the support substrate (6).
- Application Date
- 18/12/2019 00:00:00
- ID No.
- P.308162
- Country/Region
- Czech Republic
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