High Throughput OMVPE Apparatus
- Detailed Technology Description
- This technology is a self-cleaning high throughput organometallic vapor phase epitaxy (OMVPE) apparatus for deposition of material on substrates, and especially for epitaxial deposition of compound semiconductor materials.
- Others
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Patents: 6,217,937
- *Abstract
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This technology is a self-cleaning high throughput organometallic vapor phase epitaxy (OMVPE) apparatus for deposition of material on substrates, and especially for epitaxial deposition of compound semiconductor materials. The technology provides a flexible reactor design capable of operating as either a cold wall reactor for chemical vapor deposition or a hot wall reactor for epitaxial deposition of compound semiconductor materials. It also provides an improved reactor design having a rotating reactor, and inlet and outlet ports arranged circumferentially around the top and bottom of the reactor chamber respectively.
The new design provides a means for dealing with the tendency of the chemicals use in chemical vapor deposition (CVD) to decompose on the reactor cell, building up on the cell wall until and deposits begin to flake off, producing particulate contaminates in the cell which damage the wafer being processed. In Cornell's new reactor, the cold wall cell can be converted into a hot wall cell for a "self cleaning" operation by replacing the cooling jacket around the outside of the outer reaction cylinder with a split clamshell furnace. During cell cleaning, the wall is heated while a corrosive gas such as HCl or a corrosive plasma is injected into the reactor cell to etch deposits off the cell wall and the susceptor. Using this approach, the cell can be cleaned periodically so that the deposits do not build up and contaminate the cell with particulate matter or with previously used reactants, and this allows cleaning to be done without disassembly or exposure to the atmosphere, thereby preventing atmospheric contamination of the cell.
Advantages
· Reaction chamber can be cleaned without exposing to air
· Cleaning procedure simple
· Improved deposition
Applications
· Chemical vapor deposition
· Epitaxial deposition of compound semiconductor materials
- *Licensing
- Patrick Govangpjg26@cornell.edu(607) 254-2330
- Country/Region
- USA
