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3D Patternable Optical Nanocomposites

Detailed Technology Description
A new photonic material with a high refractive index (1.68), prepared by two-photon lithograph.
Others

Patent Applications: PCT/US2004/16620; 4642844

*Abstract

The invention is a new photonic material with a high refractive index (1.68), prepared by two-photon lithography. The material is composed of molecules that include at least one thiirane ring (three membered cyclic sulfides), which subsequently results in a photonic crystal structure.

Up to date, photonic crystals have been restricted to those of low refractive indices (at most 1.6) with the associated limited band gap. Hence, utilizing thiiranes is an appealing solution since they have a high refractive index due to the presence of sulfur atoms. The resulting photonic crystal can be used to control the flow of electromagnetic waves for numerous technological applications.                     

  

Potential Applications

  • Next generation optical devices utilizing photonic crystals, such as ultra-high efficiency lasers or micro-miniature optical integrated circuits
  • Extended applications in micromachine and microreactor technology

  

Advantages

  • High resolution and structure diversity obtained through two-photon lithography
  • High reactivity and high refractive index of thiiranes, suitable for photosensitive materials
  • A further heightened refractive index via addition of a brominated epoxy resin
*Licensing
Martin Teschlmt439@cornell.edu(607) 254-4454
Country/Region
USA

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