Photolithographic Patterning of Biologically Active Materials
- Detailed Technology Description
- Cornell researchers have developed a novel photolithographic patterning method that allows multiple organic/biological materials to be patterned via orthogonal processing without damaging their performance.
- Others
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Issued US Patent 9,259,759
- *Abstract
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Cornell researchers have developed a novel photolithographic patterning method that allows multiple organic/biological materials to be patterned via orthogonal processing without damaging their performance. This invention specifically enables a lithographic patterning process for biologically active materials with the help of highly fluorinated polymeric materials and fluorous solvents. The use of bio-compatible solvents and special imaging materials allows lithographic methods to be directly applied to the patterning of biomolecules. Additionally, the novel process enables patterning of multiple proteins on a single surface.
Potential Applications
- Micro- and nano-scale biodevices
- Bio-materials processing and research
Advantages
- Orthogonal processing without damaging fragile biomolecules
- Straightforward patterning of multiple proteins on a single substrate
- Bio-compatible solvents
- *Licensing
- Carolyn Theodorecat42@cornell.edu607-254-4514
- Country/Region
- USA
