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Environmentally Friendly Photoacid Generators (PAGs)

Detailed Technology Description

This invention includes a novel class of counter ions containing far fewer perfluorinated carbons than PFOS; environmental concerns are thereby addressed.

Others

Patent: 7,393,627

*Abstract

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Photoacid generators (PAGs) play a critical role in chemically amplified resist systems. Proposed changes in government regulations concerning perfluorooctyl sulfonates (PFOS) threaten to make certain PFOS-containing PAGs obsolete. Typical polar ionic PAGs consist of a photosensitive onium cation and an acidic counter ion (often PFOS/PFAS), which is released when the PAG is exposed to light.

This invention includes a novel class of counter ions containing far fewer perfluorinated carbons than PFOS; environmental concerns are thereby addressed. Perfluorinated groups are replaced with alternate groups that maintain the strong polarization (high pKa) of PFOS, and contribute strongly to homogeneous film formation. Moreover, this invention offers other significant advantages over PFOS-based PAGs, including more uniform distribution of the PAG within the resist, optimum mobility of the photogenerated acid within the resist and reduced line edge roughness (LER).

  

Potential Applications

• Semiconductor manufacturing & microfabrication
  
  • EUV technology and 193nm DUV for lithography

  

Advantages

• PFOS-free
• Improved lithographic performance with commercially accepted resist
  
  • Increased photospeed/sensitivity
• Higher biotic/abiotic degradation and no bioaccumulation
• Reduces amount of fluorine and function groups
• Promotes uniform distribution and optimum diffusion
  
  • Reduced line width (LWR) and line edge roughness (LER)
• Reduced leaching levels
• Thermally stable
• Suitable for use in vacuum processes

*Licensing

Carolyn Theodorecat442@cornell.edu(607) 254-4514

Country/Region

USA