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Mass Fabrication of Graphene Nanoelectromechanical Systems

Detailed Technology Description: Large arrays of single-layer graphene resonators withtunable, reproducible resonance frequency and high quality factor (Q) werefabricated on silicon wafers, addressing key challenges of mass producinggraphene nanoelectromechanical (NEMs) devices.

Others

Robert Barton, Jeevak Parpia, and Harold G. Craighead, Fabrication and performance of graphene nanoelectromechanical systems, J. Vac. Sci. Technol. B 29, 050801 (2011)
Anne Ju, Graphene to propel mechanical device technology forward, Cornell Chronicle 8 Nov. 2011
Katharine Bourzac, Making Graphene Nanomachines Practical, Technology Review 1 Dec. 2010

*Abstract: Large arrays of single-layer graphene resonators withtunable, reproducible resonance frequency and high quality factor (Q) werefabricated on silicon wafers, addressing key challenges of mass producinggraphene nanoelectromechanical (NEMs) devices. Graphene’s unparalleled strength,stiffness and low mass per unit area make it an ideal material fornanomechanical resonators. However,until now it has been challenging to fabricate graphene resonators in largenumbers, and existing devices show uncontrollable frequencies and relativelylow Q.
The Cornell graphene nano-resonators are made using chemicalvapor deposition (CVD) growth followed by patterning and transfer. This industrial process enables production ofa large numbers of devices with improved properties, including reproducibleresonance frequencies and mode shapes, as well as high Q an order of magnitudegreater than previously achieved with monolayer graphene. These promising results can enable grapheneto propel mechanical device technology forward for a variety of applicationsincluding high-sensitivity sensors of mass, force, position and pressure, andtunable filters for wireless communications.
Potential Applications: NEMs applications for signalprocessing, sensing, etc.
Advantages: high volume process, high Q,reproducible and tunable resonance frequency

*Licensing: Martin Teschlmt439@cornell.edu(607) 254-4454

Country/Region: USA

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