Laser Crystallization at Low Temperature and Pressure
- Detailed Technology Description
- Researchers at Purdue University have developed an alternative process that performs at low temperatures and at atmospheric pressure, making it less costly than currently used processes.
- *Abstract
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Many processes use direct-pulsed laser recrystallization to crystallize thin films because it improves electric mobility and reduces crystal defects. These processes usually require high temperatures and costly vacuum systems, making them non-selective and limiting the materials used for the substrate.
Researchers at Purdue University have developed an alternative process that performs at low temperatures and at atmospheric pressure, making it less costly than currently used processes. This process would be widely used in thin film electronics such as solar cells, LEDs, and flexible electronics.
Advantages:
-Can be performed at low temperatures and at atmospheric pressure
-Compared to alternative processes, less costly
- Country/Region
- USA
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