Method Of Drying Passivated Micromachines By Dewetting From A Liquid-based Process
- Technology Benefits
- LICENSING/COLLABORATION Technology available for licensing on a non-exclusive basis, for a flat annual fee. BUNDLE Inventions B93-054 and B96-052 are offered together as a bundle.
- Technology Application
- Surface Micromachining Processes
- Detailed Technology Description
- None
- Supplementary Information
- Patent Number: US6114044A
Application Number: US1997866833A
Inventor: Houston, Michael R. | Howe, Roger T. | Maboudian, Roya | Srinivasan, Uthara
Priority Date: 30 May 1997
Priority Number: US6114044A
Application Date: 30 May 1997
Publication Date: 5 Sep 2000
IPC Current: B81B000300
US Class: 428447 | 216074 | 216096 | 310309 | 427058 | 427309 | 427352 | 427354 | 4274432
Assignee Applicant: The Regents of the University of California
Title: Method of drying passivated micromachines by dewetting from a liquid-based process
Usefulness: Method of drying passivated micromachines by dewetting from a liquid-based process
Summary: For fabricating MM such as motors and gear trains.
Novelty: Fabrication of micromachine e.g. motors, involves constructing low surface energy film on micromachine and rinsing the micromachine with rinse liquid having high surface energy to form specific contact angle
- Industry
- Electronics
- Sub Category
- Semiconductor
- Application No.
- 6114044
- Others
-
Tech ID/UC Case
18427/1996-052-0
Related Cases
1996-052-0
- *Abstract
-
A method of fabricating a micromachine that includes the step of constructing a low surface energy film on the micromachine. The micromachine is then rinsed with a liquid that has a high surface energy (relative to the low surface energy film) to produce a contact angle of greater than 90 degrees between the low surface energy film and the rinse liquid. This relatively large contact angle causes any rinse liquid on the micromachine to be displaced when the micromachine is removed from the rinse liquid.
In other words, the micromachine is dried by dewetting from a liquid-based process. Thus, a separate evaporative drying step is not required, as the micromachine emerges from the liquid-based process in a dry state. The relatively large contact angle (greater than 90 degrees) also operates to prevent attractive capillary forces between micromachine components, thereby reducing both release-related and in-use stiction.
The low surface energy film may be constructed with a fluorinated self-assembled monolayer film. The processing of the invention avoids the use of environmentally harmful and health-hazardous chemicals.
- *IP Issue Date
- Sep 5, 2000
- *Principal Investigator
-
Name: MICHAEL HOUSTON
Department:
Name: Roger Howe
Department:
Name: Roya Maboudian
Department:
- Country/Region
- USA
