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Solvent-Assisted Lithographic Process Using Photosensitive Sol-Gel Derived Glass
Detailed Technology Description
This invention describes a process for manufacturing high precision structures on silicon substrates. These structures can be used in applications such as integrated optical devices and biomedical sensors. This process enables the user to manufacture high volumes with low capital investments. Further it does not require high temperature processing and can be quickly adapted to different designs using inexpensive photomasks.
Country/Region
USA
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