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Semiconductor thin film crystallization with decreased edge effects

Summary
James S. Im, Ph.D.
Technology Benefits
Provides a smooth visual transition between pixelsDoes not require additional manufacturing timeCan be used with two or more consecutive laser pulsesPatent information:Patent Issued (US 7300858)Patent Issued (US 7259081)Patent Issued (US 8476144)Tech Ventures Reference: IR M02-061
Technology Application
Thin film transistor (TFT) manufacturingLiquid crystal display (LCD) manufacturingImage sensorsReduced power integrated circuits
Detailed Technology Description
James S. Im, Ph.D.
*Abstract
None
*Inquiry
Jim AloiseColumbia Technology VenturesTel: (212) 854-8444Email: TechTransfer@columbia.edu
*IR
M02-061
*Principal Investigator
*Publications
Sposili, Robert, Im, James S. "Sequential lateral solidification of thin silicon films on SiO2. 1996 Nov 4; 69(19):2864-2866.
*Web Links
Patent number: CN1685474Patent: Issued Patent
Country/Region
USA

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