Semiconductor thin film crystallization with decreased edge effects
- Summary
- James S. Im, Ph.D.
- Technology Benefits
- Provides a smooth visual transition between pixelsDoes not require additional manufacturing timeCan be used with two or more consecutive laser pulsesPatent information:Patent Issued (US 7300858)Patent Issued (US 7259081)Patent Issued (US 8476144)Tech Ventures Reference: IR M02-061
- Technology Application
- Thin film transistor (TFT) manufacturingLiquid crystal display (LCD) manufacturingImage sensorsReduced power integrated circuits
- Detailed Technology Description
- James S. Im, Ph.D.
- *Abstract
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None
- *Inquiry
- Jim AloiseColumbia Technology VenturesTel: (212) 854-8444Email: TechTransfer@columbia.edu
- *IR
- M02-061
- *Principal Investigator
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- *Publications
- Sposili, Robert, Im, James S. "Sequential lateral solidification of thin silicon films on SiO2. 1996 Nov 4; 69(19):2864-2866.
- *Web Links
- Patent number: CN1685474Patent: Issued Patent
- Country/Region
- USA
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