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Fabrication of Nanoscale Metal Electrodes for Molecular Electronics

Technology Benefits

-- Sub-10nm gap spacing is achievable enabling molecular electronics testing-- Nanometer gap control with conventional, high throughput lithographic techniques-- Low cost addition to conventional lithography methods-- Self-aligning method achieves precise control of gap spacing (1 nm)-- Modular manufacturing allows for specific electrode designPatent information: ~ see link below ~US 2011/0268844 A1

Technology Application

-- Nanoscale electrodes for nanoelectronic devices-- Miniaturization of integrated circuits-- Electronic probing of molecular systems-- Self-assembly of molecular electronic devices-- Nano-biosensors and lab-on-a-chip

Detailed Technology Description

Tech Ventures Reference: IR M05-093Self-aligning lithography method that creates nanoscale inter-electrode gaps for use in nano-electronic applications. Conventional lithography patterning is utilized in a two-step process. In...

*Abstract

None

*Inquiry

Jullian JonesColumbia Technology VenturesTel: (212) 854-8444Email: TechTransfer@columbia.edu

*IR

m05-093

*Principal Investigator

*Publications

-- J. Tang , E. P. De Poortere, J. E. Klare , C. Nuckolls , S. J. Wind. Single-molecule transistor fabrication by self-aligned lithography and in-situ fabrication. Microelectron. Eng., Vol. 83, 2006 pp, 1706-1709.-- X. Guo, J. P. Small, J. E. Klare, Y. Wang, I. Tam, M. S. Purewal, B. H. Hong, R. Caldwell, L. Huang, S. O'Brien, J. Yan, R. Breslow, S. J. Wind, J. Hone, P. Kim, and C. Nuckolls. Covalently Bridging Gaps in Single-Walled Carbon Nanotubes with Conducting Molecules. Science, Vol. 311, 2006, pp. 356-359.-- J. Tang, Y. Wang, J. E. Klare, G S. Tulevski, S J. Wind, C. Nuckolls. Encoding Molecular-Wire Formation within Nanoscale Sockets. Angewandte Chemie, Vol. 46, Issue 21, May 2007, pp. 3892-3895.

*Web Links

USPTO: US20070059645A1USPTO: US2011/0268844 A1

Country/Region

USA