A Technology of Metal-Induced Crystallization of Amorphous Silicon and Metal-Gettering非晶硅的金屬誘導結晶技術
- Summary
- Metal induced crystallization (MIC) is a promising technology for obtaining poly-Si based thin-film transistors (TFTs). It is conventionally a 'one-step process' that does not have the possibility to remove any metal elements during the crystallization hear-treatment. As a consequence, large amount of metal elements are accumulated and affect the quality of poly-Si formed and the performance of the devices.
This invention is the introduction of an in-situ technique to remove a controlled amount of metal elements during the crystallization heat treatment process. Removal of metal elements is done by introducing an a-Si thin film, prior to the crystallization heat treatment. A sufficient amount of metal elements is added to nucleate MIC and simultaneously remove some of the metal elements during the subsequent crystallization heat treatment. The quality of the resulting poly-Si is therefore improved and the amount of residual metal elements is reduced. The present invention allows large-area MIC with reduced metal contamination, reduced effects of glass shrinkage on pattern definition, improved device performance while retaining the advantage of a reduced process time.
- Technology Benefits
- 1. Reduced metal contamination
2. Better device performance
3. Shorter process time
4. Large-area crystallization
5. Reduced pattern distortion
- Technology Application
- - Flat-panel liquid-crystal displays
- 3G mobile phone displays
- PDA displays
- Computer Displays
- LCD-TVs
- Sensors
- 3-dimensional integrated circuits
- Supplementary Information
- Patent Number: US9210451B2
Application Number: US13111786A
Inventor: Zhou, Yipeng | Fu, Zhengjia | Chiu, Dah Ming
Priority Date: 19 May 2011
Priority Number: US9210451B2
Application Date: 19 May 2011
Publication Date: 8 Dec 2015
IPC Current: H04N002163 | H04N0021218 | H04N0021231 | H04N0021239 | H04L002908
Assignee Applicant: The Chinese University of Hong Kong
Title: Replication decision in P2P VoD systems
Usefulness: Replication decision in P2P VoD systems
Novelty: System for making replication decision in peer-to-peer video-on-demand (P2P VoD) architecture, has server which determines whether one of videos is to be replaced with other video according to information and replication indicators
- Industry
- Electronics
- Sub Category
- Semiconductor
- Application Date
- 23 Apr 2008
- Application No.
- Hong Kong 08104517.8
- Patent Information
- Hong Kong HK1117641
- ID No.
- TTC.PA.255S
- Country/Region
- Hong Kong
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