Nanostructure Fabrication System
- Technology Benefits
- Simplifies the manufacturing sequenceEnables low temperature processingAccommodates different material systemsLow cost in comparison to current manufacturing methods
- Technology Application
- Data storageNanoscale transistorsNanobiosensing, biomedical sensing, and biological nanostructuresDisplaysFiltration
- Detailed Technology Description
- None
- Application No.
- 8728720
- Others
-
Tech ID/UC Case
20929/2010-135-0
Related Cases
2010-135-0
- *Abstract
-
Manufacturing nanoscale devices and patterns requires the generation of nanostructures with well-defined properties. It is challenging to produce controlled nanostructures on large areas with targeted functionality while keeping cost at low level. Conventional fabrication methods are lithography-based, and therefore are multi-step, use toxic solvents, and have a high implementation cost. Maskless nanopatterning approaches, both optical and non-optical, represent an improvement, but still require multiple steps, high processing temperatures, and are limited with respect to the choice of material system.
UC Berkeley researchers have developed a technology that allows the massive generation of nanostructures, and represents an entirely new method of nanomanufacturing. The method simplifies the manufacturing sequence, enables low temperature processing, and significantly reduces cost.
- *IP Issue Date
- May 20, 2014
- *Principal Investigator
-
Name: Costas Grigoropoulos
Department:
Name: David Jen Hwang
Department:
- Country/Region
- USA
