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Nanostructure Fabrication System

技術優勢: Simplifies the manufacturing sequenceEnables low temperature processingAccommodates different material systemsLow cost in comparison to current manufacturing methods

技術應用: Data storageNanoscale transistorsNanobiosensing, biomedical sensing, and biological nanostructuresDisplaysFiltration

*Abstract: Manufacturing nanoscale devices and patterns requires the generation of nanostructures with well-defined properties. It is challenging to produce controlled nanostructures on large areas with targeted functionality while keeping cost at low level. Conventional fabrication methods are lithography-based, and therefore are multi-step, use toxic solvents, and have a high implementation cost. Maskless nanopatterning approaches, both optical and non-optical, represent an improvement, but still require multiple steps, high processing temperatures, and are limited with respect to the choice of material system.

UC Berkeley researchers have developed a technology that allows the massive generation of nanostructures, and represents an entirely new method of nanomanufacturing. The method simplifies the manufacturing sequence, enables low temperature processing, and significantly reduces cost.

*Principal Investigation: Name: Costas Grigoropoulos
Department:

Name: David Jen Hwang
Department:

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