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Magnetic Field-Guided Metal-Assisted Chemical Etching

Detailed Technology Description: Researchers at the University of Illinois have developed a magnetic field-guided, metal-assisted chemical etching technique (h-MacEtch).

*Abstract: Researchers at the University of Illinois have developed a magnetic field-guided, metal-assisted chemical etching technique (h-MacEtch), which applies an external magnetic field to the existing metal-assisted chemical etching of semiconductor materials. This technology allows anisotropic formation of high-aspect-ration 3D micro and nano structures.
For more information about this technology, please contact the University of Illinois at Urbana-Champaign Office of Technology Management at otm@illinois.edu.

Country/Region: USA

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