Magnetic Field-Guided Metal-Assisted Chemical Etching
- 详细技术说明
- Researchers at the University of Illinois have developed a magnetic field-guided, metal-assisted chemical etching technique (h-MacEtch).
- *Abstract
-
Researchers at the University of Illinois have developed a magnetic field-guided, metal-assisted chemical etching technique (h-MacEtch), which applies an external magnetic field to the existing metal-assisted chemical etching of semiconductor materials. This technology allows anisotropic formation of high-aspect-ration 3D micro and nano structures.
For more information about this technology, please contact the University of Illinois at Urbana-Champaign Office of Technology Management at otm@illinois.edu.
- 国家/地区
- 美国
欲了解更多信息，请点击 这里
