The present invention relates to a chemical vapour deposition (CVD) system and process, and in particular to a system and process for depositing semiconductors such as silicon carbide.
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A planar and low-profile high gain antenna with an ability to change direction of radiation to any desired location in a conical region, covering a major portion of the upper hemisphere, without severe performance penalty.
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We have developed a cost-effective, highly-efficient photocatalyst that is activated using visible light. Our catalyst has potential applications in decontamination and disinfection processes and manufacture of chemicals using renewable energy.
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