Full Color Quantum Dot Patterning Via Soft Lithography
Versatile, applicable to large areas No requirement on pressure uniformity as in conventional transfer printing techniquesNo contamination to QD layers since it is not reliant on solventsCost-effective: reusable molds, easy fabrication (no need for clean room)High resolution
Large-scale patterning for QDsNext-generation QD-based televisions, displays, QD-LED products
UCLA researchers have applied chemical lift-off lithography (CLL) to achieve nanoscale patterning of QDs. To make multi-color QDs configuration, a stamp with desired pattern is used to selectively remove some QDs and then a second-layer of a different color QDs is backfilled into the exposed region. This process can be repeated to achieve selective positioning of multi-color QDs over large areas for application in QD displays. Sub-micron patterns of QDs could be achieved straightforwardly by controlling the interactions between the interfaces of stamps, QDs, and the substrate.
Background The application of quantum-dot (QD) materials to next-generation light-emitting devices (LEDs) and high resolution displays has transformed the electronics industry. However, no current technologies can deliver cost-effective manufacturing of these devices. Previous applications utilize monochromatic color QDs or mixed (polychromatic) QDs films. Transfer printing or contact-printing strategies have been proposed previously for application to high-resolution and multi-color patterning of quantum dots. Other approaches demonstrated in the literature include ink jet printing, self-assembly, and mask patterning. Additional Technologies by these Inventors Tech ID/UC Case 28993/2017-702-0 Related Cases 2017-702-0
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