Full Color Quantum Dot Patterning Via Soft Lithography
- 技術優勢
- Versatile, applicable to large areas No requirement on pressure uniformity as in conventional transfer printing techniquesNo contamination to QD layers since it is not reliant on solventsCost-effective: reusable molds, easy fabrication (no need for clean room)High resolution
- 技術應用
- Large-scale patterning for QDsNext-generation QD-based televisions, displays, QD-LED products
- 詳細技術說明
- UCLA researchers have applied chemical lift-off lithography (CLL) to achieve nanoscale patterning of QDs. To make multi-color QDs configuration, a stamp with desired pattern is used to selectively remove some QDs and then a second-layer of a different color QDs is backfilled into the exposed region. This process can be repeated to achieve selective positioning of multi-color QDs over large areas for application in QD displays. Sub-micron patterns of QDs could be achieved straightforwardly by controlling the interactions between the interfaces of stamps, QDs, and the substrate.
- *Abstract
-
UCLA researchers in the Department of Chemistry and Biochemistry have developed a novel quantum dot patterning method via soft lithography. It allows cost-effective, large-scale and high resolution full-color quantum dots patterning, which will revolutionize the nanoelectronics and QD-based display industries.
- *Principal Investigation
-
Name: Paul Weiss
Department:
Name: Chuanzhen Zhao
Department:
- 其他
-
Background
The application of quantum-dot (QD) materials to next-generation light-emitting devices (LEDs) and high resolution displays has transformed the electronics industry. However, no current technologies can deliver cost-effective manufacturing of these devices. Previous applications utilize monochromatic color QDs or mixed (polychromatic) QDs films. Transfer printing or contact-printing strategies have been proposed previously for application to high-resolution and multi-color patterning of quantum dots. Other approaches demonstrated in the literature include ink jet printing, self-assembly, and mask patterning.
Additional Technologies by these Inventors
- Determining Oil Well Connectivity Using Nanoparticles
- High-Throughput Microfluidic Gene-Editing via Cell Deformability within Microchannels
- High-Throughput Intracellular Delivery of Biomolecular Cargos via Vibrational Cell Deformability within Microchannels
- Guided Magnetic Nanospears For Targeted And High-Throughput Intracellular Delivery
- Scalable Lipid Bilayer Microfluidics for High-Throughput Gene Editing
- Multiple-Patterning Nanosphere Lithography
Tech ID/UC Case
28993/2017-702-0
Related Cases
2017-702-0
- 國家/地區
- 美國
