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Real-Time, In-Situ, Monitor for Metrology of Nanostructures
技术优势
Real-timeanalysis of the evolution of nanostructuresIncreased control over nanostructure size,shape, growth and processCorrectand maintain optimum nanostructure growth conditionsApplicationsinclude industry and researchers who are fabricating periodic arrays ofnanowire, nanowall, and other nanostructures, semiconductor, and solid-statelighting applications
详细技术说明
This invention describes a new metrology tool that would have application in the monitoring of nanostructure fabrication.
国家/地区
美国
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