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Composition and Method of Forming Functionalized Cyclohexasilanes
详细技术说明
None
附加资料
Patent Number: US8609799B2
Application Number: US2010993239A
Inventor: Schulz, Douglas L. | Dai, Xuliang | Nelson, Kendric J. | Boudjouk, Philip
Priority Date: 29 May 2008
Priority Number: US8609799B2
Application Date: 5 Jan 2011
Publication Date: 17 Dec 2013
IPC Current: C08G007730
US Class: 528023 | 423341 | 423342 | 528010 | 528033 | 528037
Assignee Applicant: NDSU Research Foundation,Fargo
Title: Method of forming functionalized silanes
Usefulness: Method of forming functionalized silanes
Summary: In electronic materials for inorganic semiconductors.
Novelty: New heteroatom doped silane derivatives useful in electronic materials for inorganic semiconductors
主要类别
化工/材料
细分类别
化工/材料应用
国家/地区
美国
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