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Synthesis and Thin Film Fabrication of Lithographically Patternable Block Copolymers Consisting of Polar and Non-polar Blocks
Detailed Technology Description
Cornell University offers a method to obtain integratednm scale patterns. This technology involves a technique to obtain high lateralordering of two immiscible self-assembling block copolymers and subsequent degradationof one of the polymers resulting in fine tunable areas having nanoscalepatterns.
Others
Publications · Rina Maeda,† Teruaki Hayakawa,† and Christopher K. Ober, “Dual Mode Patterning of Fluorine-ContainingBlock Copolymers through Combined Top-down and Bottom-up Lithography”, Chem. Mater. 2012, 24, 1454−1461. · C. Ober, R. Maeda, N. You, T. Hayakawa. Block Copolymers and LithographicPatterning Using Same; U.S. Patent 9,541,830. January 10, 2017.
Country/Region
USA
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