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Polymer Brush Patterns

Technology Benefits

Surface-initiated synthesis Chemically modified substrate surface Eliminates the need for expensive photolithographic tools

Technology Application

Microelectronics Microfabrication

Detailed Technology Description

Researchers at the University of California, Davis have developed a novel method for the preparation of patterned polymer brushes. The formation of a patterned surface is achieved by using a microcontact printing technique followed by surface-initiated synthesis of polymer brushes within the framework of the pattern. In contrast to the production of complex patterns in polymer films on surfaces that combine spin-casting and photolithographic techniques, polymer films patterned by microcontact printing and surface-initiated synthesis are not limited by the stability of spin-coated films to solvents and chemical reaction, and difficulties in preparing uniform films over large areas and complicated topographies.

Supplementary Information

Patent Number: US6780492B2
Application Number: US200274395A
Inventor: Hawker, Craig Jon | Hedrick, James Lupton | Abbott, Nicholas
Priority Date: 2 Mar 1999
Priority Number: US6780492B2
Application Date: 11 Feb 2002
Publication Date: 24 Aug 2004
IPC Current: B05D000118 | B05D000128 | G03F000700 | G03F000716
US Class: 428198 | 428332 | 428333 | 428338 | 428339
Assignee Applicant: International Business Machines Corporationmonk | The Regents of the University of California
Title: Substrates prepared by chemical amplification of self-assembled monolayers with spatially localized polymer brushes
Usefulness: Substrates prepared by chemical amplification of self-assembled monolayers with spatially localized polymer brushes
Summary: For preparing substrate having patterned surface for fabricating microelectronic devices.
Novelty: Patterned surface substrate preparation method involves contacting predetermined regions on substrate surface with A-B moiety, after which derivatized surface is contacted with A'-L-C moiety