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High device-to-device uniformity in thin film transistors

Summary

Thin film transistors are important components of advanced technological consumer products such as LCD displays. Thin film transistors need to have high device-to-device uniformity to ensure optimal functionality. This is increasingly challenging in low-temperature polycrystalline silicon processes because the inherent randomness of grain boundaries contributes to troublesome off-current. This technology provides a solution to this problem by proposing an alternative alignment of the microstructure relative to the channel region. With some control in patterning, this may decrease the spread in the number of perpendicular grain boundaries. The end result is large device-to-device uniformity and improved performance.

Technology Benefits

Simple procedureImproved device-to-device uniformityImproved performancePatent Information:Patent Issued (US 7,160,163)Tech Ventures Reference: IR M02-012

Technology Application

Low temperature polycrystalline silicon processesThin film transistorsLiquid crystal displays

Detailed Technology Description

None

Country/Region

USA

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