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Decreasing surface roughness of thin film semiconductors using laser processing
Summary
James Im, Ph.D..
Technology Benefits
Improves performance of crystallized thin film semiconductorsImplementable as both a processing and post-processing stepCompatible with multiple different crystallization techniques, such as sequential lateral solidificationVarious beam shapes can be usedPatent information:Patent Issued (US 7220660)Tech Ventures Reference: IR MS99/04/26E
Technology Application
Thin film transistor (TFT) manufactureSemiconductor processingFabrication of flat panel displays
Detailed Technology Description
James Im, Ph.D..
Country/Region
USA
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