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Sub-10 nm fabrication: molecular templating, electron-beam sculpting and crystallization of metallic nanowires
Detailed Technology Description
This technology provides a technique for fabricating metallic structures with dimensions considerably smaller than 10 nm and the use of a focused electron beam to locally manipulate nanowires with a resolution of about 3 nm. This is the first technology to use an electron beam and achieve such a high resolution of matter manipulation.
Countries
United States
Application No.
7749922
Country/Region
USA
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