Decreasing surface roughness of thin film semiconductors using laser processing
- 总结
- James Im, Ph.D..
- 技术优势
- Improves performance of crystallized thin film semiconductorsImplementable as both a processing and post-processing stepCompatible with multiple different crystallization techniques, such as sequential lateral solidificationVarious beam shapes can be usedPatent information:Patent Issued (US 7220660)Tech Ventures Reference: IR MS99/04/26E
- 技术应用
- Thin film transistor (TFT) manufactureSemiconductor processingFabrication of flat panel displays
- 详细技术说明
- James Im, Ph.D..
- *Abstract
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None
- *Inquiry
- Jim AloiseColumbia Technology VenturesTel: (212) 854-8444Email: TechTransfer@columbia.edu
- *IR
- MS99/04/26E
- *Principal Investigation
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- 国家/地区
- 美国
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