Method Of Fabricating Patterned Surfaces With Nanoparticles And Nanowires
- Technology Benefits
- Simple and direct method for selective deposition of metallic nanoparticles with nanometer-scale precision.
- Technology Application
- This method can form the basis for fabricating electronically conducting features, waveguides, and other devices for nano- electronic and photonic applications.
- Detailed Technology Description
- None
- Supplementary Information
- Patent Number: US7687145B2
Application Number: US2005244446A
Inventor: Frechet, Jean M. J. | Fresco, Zachary M.
Priority Date: 4 Oct 2004
Priority Number: US7687145B2
Application Date: 4 Oct 2005
Publication Date: 30 Mar 2010
IPC Current: B32B000516 | C01F000702 | C01F000708
US Class: 428403 | 428221 | 428704 | 556427 | 556429 | 556437 | 556449 | 556465 | 556482 | 556489
Assignee Applicant: The Regents of the University of California
Title: Compounds containing a thiol protected group bonded to a protecting group via a polarized bond, and structure comprising the compounds on its surface
Usefulness: Compounds containing a thiol protected group bonded to a protecting group via a polarized bond, and structure comprising the compounds on its surface
Summary: The organic compound, e.g. 3,5-dimethoxy-α,α-dimethylbenzyloxycarbony1-3-mercaptopropyltriethoxysilane, is used for forming protected thiol-containing reactive organic layer for nanoscale structure (claimed). It is used in the formation of patterns of electrically conductive nanoparticles, e.g. gold nanoparticles or silver nanoparticles, useful in nanoelectronics and photonics e.g. as electrically conducting wires, as plasmon wave guides for photonic devices or as seeds for the growth of silicon nanorods.
Novelty: Organosulfur compound as protected thiol-containing reactive layer precursor used in forming nanoscale structure, comprises protected thiol functional group, and protecting group bonded to protected functional group
- Industry
- Chemical/Material
- Sub Category
- Chemical/Material Application
- Application No.
- 7687145
- Others
-
Tech ID/UC Case
17447/2005-010-0
Related Cases
2005-010-0
- *Abstract
-
The capability to pattern closely spaced gold or other nanoparticles has significant potential in nano- electronics and photonics applications such as electrically conducting wires, and as plasmon wave guides.
To address this opportunity, researchers at UC Berkeley have developed an innovative method for fabricating nanoscale patterned surfaces with nanoparticles and nanowires. Using this approach, the researchers were able to fabricate lines of closely spaced 10 nm gold nanoparticles that are a single nanoparticle in width. Furthermore, standard plating techniques can be used to transform an assembly of these nanoparticles into nanowires or other continuous patterned features.
In comparison to existing methods for depositing arbitrary patterns of nanoparticles such as e-beam lithography, dip-pen nanolithography and several other atomic force microscopy-based methods, this new Berkeley method is simple and direct.
- *IP Issue Date
- Mar 30, 2010
- *Principal Investigator
-
Name: Jean M. J. Frechet
Department:
Name: Zachary Fresco
Department:
- Country/Region
- USA
