Simultaneous laser crystallization of multiple silicon films for TFTs
- 總結
- James Im, Ph.D.
- 技術優勢
- Produces uniform semiconductor filmsCost efficient manufacturing method using lasersFast production of polycrystalline semiconductor filmsCompatible with Excimer Laser Annealing (ELA) and Sequential Lateral Solidification (SLS) techniquesPatent Information:Patent Pending (US 20140001164)Tech Ventures Reference: IR M03-052
- 技術應用
- High performance TFTsLiquid crystal displaysOLEDs3-D integrated circuitsSemiconductor circuits
- 詳細技術說明
- James Im, Ph.D.
- *Abstract
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None
- *Inquiry
- Jim AloiseColumbia Technology VenturesTel: (212) 854-8444Email: TechTransfer@columbia.edu
- *IR
- M03-052
- *Principal Investigation
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- *Web Links
- Patent application: US20050059265U.S. Patent: 7,364,952
- 國家/地區
- 美國
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