Simultaneous laser crystallization of multiple silicon films for TFTs
- 总结
- James Im, Ph.D.
- 技术优势
- Produces uniform semiconductor filmsCost efficient manufacturing method using lasersFast production of polycrystalline semiconductor filmsCompatible with Excimer Laser Annealing (ELA) and Sequential Lateral Solidification (SLS) techniquesPatent Information:Patent Pending (US 20140001164)Tech Ventures Reference: IR M03-052
- 技术应用
- High performance TFTsLiquid crystal displaysOLEDs3-D integrated circuitsSemiconductor circuits
- 详细技术说明
- James Im, Ph.D.
- *Abstract
-
None
- *Inquiry
- Jim AloiseColumbia Technology VenturesTel: (212) 854-8444Email: TechTransfer@columbia.edu
- *IR
- M03-052
- *Principal Investigation
-
- *Web Links
- Patent application: US20050059265U.S. Patent: 7,364,952
- 国家/地区
- 美国
欲了解更多信息，请点击 这里
