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Spectrometer with Improved Optical System to Increase Sensitivity

Detailed Technology Description

A novel optical system for Inductively Coupled Argon Plasma Optical Emission Spectrometers (ICP-OES) has been invented.

Others

Patent: 6,122,050

*Abstract

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A novel optical system for Inductively Coupled Argon Plasma Optical Emission Spectrometers (ICP-OES) has been invented by Cornell University researchers. The optical system is specifically designed to increase the sensitivity of axially viewed ICP-OESs. Such devices which utilize this new optical system have demonstrated increased sensitivity by a factor of 10 to 30 fold without introducing matrix defects. Additionally, radially viewed ICP-OESs can be easily and economically retrofitted with this new optical system.

 

The optical system of this invention comprises a collimating lens housed in a cooling device such that the lens can be placed in, or very near, the tip of the axial plasma viewed by the spectrometer. A short field of focus is made possible through this configuration and will allow better sampling of emission spectra while reducing matrix interference effects. The collimating lens, in combination with a focusing lens, makes it possible to optically section the plasma more precisely. As a result, the best viewing region of the plasma channel can be accurately imaged onto the spectrometer entrance slit.

 

Potential Applications

• Improved design of ICP-OES devices to increase sensitivity

 

Advantages

• Increased sensitivity of measurement (10 to 30 fold)
• Negates matrix problems
• Economical retrofit of existing radial spectrometer possible

*Licensing

Carolyn A. Theodorecat42@cornell.edu (607) 254 4514

Country/Region

USA