Search
  • 網站搜尋
亞洲知識產權資訊網為知識產權業界提供一個一站式網上交易平台,協助業界發掘知識產權貿易商機,並與環球知識產權業界建立聯繫。無論你是知識產權擁有者正在出售您的知識產權,或是製造商需要購買技術以提高操作效能,又或是知識產權配套服務供應商,你將會從本網站發掘到有用的知識產權貿易資訊。
返回搜索結果

Ultrastable Porous Aluminosilicate Structures and Derived Compositions for Industrial Catalysis


詳細技術說明

Introduction The ability to create industrial strength catalytic materials with desired pore sizes can improve efficiency in existing industrial processes that modify vast volumes of fluid. Tunable pore sizes of interest 'in catalysis' include micropores (pore diameters up to 2 nm) and mesopores (2 to 50 nm). Description of Technology This technology is a porous aluminosilicate material (zeolite) that resists degradation from high temperatures and steam and a process for attaining 'tunable' pore sizes. The resulting pore sizes depend on surfactant-directed (e.g., detergent) assembly of zeolitic seeds derived from clay or transformed zeolites.A composite material is formed and comprised of a templated mesoporous phase and smaller microporous crystalline zeolite phase. The balance between mesopores and micropores may be tailored to achieve optimal catalytic performance. The resulting framework of aluminosilicates, gallosilicates, or titanosilicates is stable in water steam and could be used for hydrocracking in refining petroleum. Key BenefitsEnhanced catalysis: Tunable porosity to optimize catalysis of a given fluid's dynamics and composition. Greater stability: Framework is steam stable and resistant to de-alumination. Integrable: Uses conventional processing and resulting material could replace existing catalytic materials. Applications Catalytic applications benefit from large reaction surfaces and molecular channels. Industrial catalysis is becoming important in the conversion of large molecules and in petroleum refinement as oil quality is becoming more diverse. Development Status The invention is ready for a pilot production scale-up effort. Patent Status US 6843977 (issued Jan 18, 2005) Inventors Thomas Pinnavaia, Yu Liu, Wenzhong Zhang Tech ID TEC2002-0019


國家/地區

美國

欲了解更多信息,請點擊 這裡
Business of IP Asia Forum
桌面版